Comparison of chelating ability of NO-, NS-, ONS-, and ONO-type Schiff base derivatives and their stability constants of Bis-complexes with copper(II)

Authors

HASAN ATABEY
ESRA FINDIK
HAYATİ SARI
MUSTAFA CEYLAN

DOI

10.3906/kim-1303-65

Abstract

The present study includes important findings relating to the number of donor atoms, species of ligands, and stabilities of complexes. Stabilities of complexes between Cu(II) ion and NO-, NS-, ONS-, and ONO-type Schiff bases were compared. Acid-base properties of the Schiff bases were explained at 25 \pm 0.1 °C and ionic strength (I) of 0.1 M supported by NaCl. The Hyperquad computer program was used for calculation of dissociation and stability constants. The overall stability constants of their Cu(II) complexes were calculated and the various formed complexes between the Schiff bases with Cu(II) ion formulated as CuL_2, CuHL_2, CuH_2L_2, and CuH_{-1}L_2 (Cu (OH) L_2). The complexes of ONS- and ONO-type tridentate ligands were more stable than those of NO- and NS-type bidentate ligands.

Keywords

Schiff bases, potentiometric titration, Hyperquad, stability constants

First Page

109

Last Page

120

Recommended Citation

ATABEY, HASAN; FINDIK, ESRA; SARI, HAYATİ; and CEYLAN, MUSTAFA (2014) "Comparison of chelating ability of NO-, NS-, ONS-, and ONO-type Schiff base derivatives and their stability constants of Bis-complexes with copper(II)," Turkish Journal of Chemistry: Vol. 38: No. 1, Article 11. https://doi.org/10.3906/kim-1303-65
Available at: https://journals.tubitak.gov.tr/chem/vol38/iss1/11